Joint symposium with Oblon in Tokyo | 2 June 2026

Oblon and Maiwald are pleased to invite you to a complimentary joint international symposium on: U.S. and European patent practice: Important Aspects for Practitioners.

Date and venue: Tuesday, 2 June 2026, 13:00 JST, at the AP Marunouchi, Tokyo

At the 2026 joint symposium, selected topics will highlight similarities and differences between the U.S. and European systems and provide practical takeaways for applicants seeking optimal outcomes in both jurisdictions. The program will cover:

1. Drafting AI applications for the U.S. – written support and more (Edwin Garlepp)
2. Recent EPO case law on AI‑related inventions and key considerations for drafting AI‑related applications (Yasuaki Koshiro)
3. Recent PTO developments in the U.S. – news and surprises (Sameer Gokhale)
4. Update from the Unified Patent Court – selected case law (Derk Vos)
5. U.S. claim construction – always a matter of interpretation (Carl Schlier)
6. EPO claim interpretation after G 1/24 – paving the way to the next referral (Matthias Hoffmann)

We look forward to welcoming practitioners interested in the latest developments and practical aspects of IP practice in the U.S. and Europe.

Registration: Joint Symposium on US and European Patent Practice – Important Aspects for Practitioners | Oblon, McClelland, Maier & Neustadt, L.L.P. — Intellectual Property Law Firm