Joint symposium with Oblon in Tokyo | 2 June 2026

A big thank you to all attendees of this year’s joint symposium at AP Marunouchi in Tokyo on “U.S. and European patent practice: Important Aspects for Practitioners” – and of course to our esteemed colleagues from Oblon for co‑organizing and hosting this event with us.

It was a great pleasure once again to discuss recent developments in U.S. and European patent practice with our Japanese clients and associates. This year’s programme focused in particular on:
🔹drafting AI‑related applications for the U.S. and the role of written support,
🔹recent EPO case law on AI inventions and key points for AI‑focused drafting,
🔹new developments and “surprises” at the USPTO,
🔹overview on present UPC trends, in particular approach to inventive step and comparison to EPO practice
🔹U.S. claim construction and its interpretative challenges, and
🔹EPO claim interpretation after G 1/24 and what may come next.

Beyond the sessions, everyone enjoyed continuing the conversations over food and drinks during the reception.

We were delighted to meet clients and colleagues in Tokyo again – and we already look forward to continuing our series of symposia in Japan in the years to come.