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The law firms Oblon and Maiwald jointly hosted an international symposium on:
U.S. and European Patent Practice – Important Aspects for Practitioners
We provided updates on the latest developments and current aspects of IP practice in the United States and Europe. As is well known, both the U.S. and the European patent systems have their respective advantages and disadvantages, which do not always align. To achieve the best results under both systems, applicants from the U.S. and Europe need to be aware of the differences and nuances between the two.
At this joint symposium, we examined selected, current aspects of IP practice relating to the filing and enforcement of patents in the U.S. and Europe. While there are similarities, applicants pursuing U.S. and European patents must understand the particularities and latest developments in each system to achieve optimal outcomes.
Key topics included:
Presenters: Andrew M. Ollis(Oblon), Naho Fujimoto (Maiwald), Grace E. Kim (Oblon), Attila Kimpan (Maiwald), David M. Longo (Oblon), Lars Häusler (Maiwald)

